Field Frequency Variation during Plasma-Chemical Deposition of Silicon-Carbon Films as a Method for Their Structural Modification
- Авторлар: Popov A.I.1,2, Barinov A.D.1,2, Yemets V.M.1, Presnyakov M.Y.3, Chukanova T.S.1
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Мекемелер:
- National Research University “Moscow Power Engineering Institute”
- Institute of Nanotechnology of Microelectronics RAS
- National Research Center “Kurchatov Institute”
- Шығарылым: № 10 (2023)
- Беттер: 22-26
- Бөлім: Articles
- URL: https://cijournal.ru/1028-0960/article/view/664486
- DOI: https://doi.org/10.31857/S1028096023100175
- EDN: https://elibrary.ru/GVECJN
- ID: 664486
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