Мақалалар тізімі

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Том 53, № 5 (2024) Development of an imagery representation apparatus for information representation in neyromorphic devices
Simonov N.
Том 54, № 1 (2025) Development of atomic layer deposition technological platform for the synthesis of micro- and nanoelectronics materials
Amashaev R., Isubgadzhiev S., Rabadanov M., Abdulagatov I.
Том 52, № 1 (2023) Разработка методики построения нелинейной модели метаморфного 0.15 мкм МHEMT InAlAs/InGaAs транзистора
Локотко В., Васильевский И., Каргин Н.
Том 52, № 3 (2023) Design of a Nonlinear Model of a Pseudomorphic 0.15 μm рHEMT AlGaAs/InGaAs/GaAs Transistor
Tsunvaza D., Ryzhuk R., Vasil’evskii I., Kargin N., Klokov V.
Том 53, № 3 (2024) Development of the Ge-MDST instrument structure with an induced p-type channel
Alyabina N., Arkhipova E., Buzynin Y., Denisov S., Zdoroveishchev A., Titova A., Chalkov V., Shengurov V.
Том 52, № 1 (2023) Calculation of the Electric Field Strength and Current Density Inside a Thin Metal Layer, Taking into Account the Skin Effect
Zavitaev E., Rusakov O., Chukhleb E.
Том 52, № 6 (2023) Performance calculation for a MEMS switch with «floating» electrode
Morozov M., Uvarov I.
Том 54, № 1 (2025) Calculation of distributions of electron beam energy absorbed in PMMA and Si using various scattering models
Rogozhin A., Sidorov F.
Том 54, № 3 (2025) Self-assembly of 3D mesostructures using local ion-plasma treatment
Babushkin A., Selyukov R., Amirov I., Naumov V., Izyumov M.
Том 54, № 2 (2025) Ferroelectric transistors: operating principles, materials, applications
Reznyukov А., Fetisenkova K., Rogozhin A.
Том 52, № 2 (2023) Cross Sections of Scattering Processes in Electron-Beam Lithography
Rogozhin A., Sidorov F.
Том 53, № 5 (2024) Parameters matching of the thermoelectric system parameters for cooling heat-loaded electronics elements
Vasil’ev Е.
Том 53, № 6 (2024) Gas Phase Composition and Fluorine Atom Kinetics in SF6 Plasma
Myakonkikh A., Kuzmenko V., Efremov A., Rudenko K.
Том 54, № 3 (2025) Stabilization of memristor cell states during initial switching process after forming
Fadeev A., Rudenko K.
Том 53, № 3 (2024) The structure and formation of non-volatile memory cells of Superflash
Abdullaev D., Bobrova E., Milovanov R.
Том 54, № 3 (2025) Structure of thin titanium nitride films deposited by magnetron sputtering
Isaev A., Rogozhin A.
Том 53, № 1 (2024) Structuring of the Surface of Thin Carbon Films During Activation by Microsecond Current Pulses
Nefedov D., Shabunin N., Bratashov D.
Том 53, № 2 (2024) Structural features and electrical properties of si(al) thermal migration channels for high-voltage photovoltaic converters
Lomov A., Seredin B., Martyushov S., Tatarintsev A., Popov V., Malibashev A.
Том 53, № 5 (2024) Temperature dependences of the breakdown voltage of a high-voltage LDMOS transistor
Novoselov А., Gusev М., Masalsky N.
Том 54, № 3 (2025) Temperature characteristics of a simple current mirror on silicon high-voltage nLDMOS with a large DRIFT area
Novoselov A., Gusev M., Masal’skii N.
Том 53, № 3 (2024) Thermal modelling and layout optimization of GaN half-bridge IC with integrated drivers and power HEMTs
Kagadey V., Kodorova I., Polyntsev E.
Том 52, № 4 (2023) Tomography of Detectors Taking Dead Time into Account
Bogdanov Y., Katamadze K., Borshchevskaya N., Avosopiants G., Bogdanova N., Kulik S., Lukichev V.
Том 54, № 1 (2025) Formation of nickel-based composite magnetic nanostructures for microelectronics and nanodiagnostics devices
Vorobyova A., Tishkevich D., Outkina E., Khodin A.
Том 53, № 4 (2024) Evolution of the Current-Voltage Characteristic of a Bipolar Memristor
Fadeev A., Rudenko K.
Том 54, № 2 (2025) Electrical characteristics of ruthenium lines with a cross-sectional area less than 1000 nm2
Glaz O., Rogozhin A.
Том 52, № 6 (2023) Electrophysical parameters of p-i-n photodiodes, irradiated with 60Co γ-quanta
Kovalchuk N., Lastovsky S., Odzhaev V., Petlitsky A., Prosolovich V., Shestovsky D., Yavid V., Yankovsky Y.
Том 52, № 5 (2023) Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
Murin D., Chesnokov I., Gogulev I., Grishkov A.
Том 52, № 1 (2023) Электрофизические характеристики и эмиссионные спектры плазмы тетрафторметана
Мурин Д., Пивоваренок С., Чесноков И., Гогулев И.
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