Thermodynamic modeling of phase formation conditions in the Si–O–C–H–He and Si–O–C–H–N–He systems

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Abstract

Thermodynamic modeling of the film synthesis process from the gas phase in the Si–O–C–H–He and Si–O–C–H–N–He systems during the decomposition of hexamethyldisiloxane was performed. The modeling used the method for calculating chemical equilibria based on minimizing the Gibbs energy of the system, implemented using the Data Bank on the properties of electronic materials. It was shown that various phase complexes containing silicon oxide, carbide, and nitride can be obtained in CVD processes of such systems. The results of the thermodynamic modeling can be useful for developing methods for the synthesis of film coatings based on such phase complexes.

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About the authors

V. A. Shestakov

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University of Architecture and Civil Engineering

Author for correspondence.
Email: vsh@niic.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630008

M. L. Kosinova

aNikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences

Email: vsh@niic.nsc.ru
Russian Federation, Novosibirsk, 630090

References

  1. Stabler C., Ionescu E., Graczyk-Zajac M. et al. // J. Am. Ceram. Soc. 2018. V. 101. P. 4817. https://doi.org/10.1111/jace.15932
  2. Colombo P., Mera G., Riedel R. et al. // J. Am. Ceram. Soc. 2010. V. 93. P. 1805. https://doi.org/10.1111/j.1551-2916.2010.03876.x
  3. Riedel R., Mera G., Hauser R. et al. // J. Ceram. Soc. Jpn. 2006. V. 114. P. 425. http://dx.doi.org/10.2109/jcersj.114.425
  4. Linck C., Ionescu E., Papendorf B. et al. // Int. J. Mater. Res. 2012. V. 103. P. 31. https://doi.org/10.3139/146.110625
  5. Rosenburg F., Balke B., Nicoloso N. et al. // Molecules. 2020. V. 25. P. 5919. 10.3390/molecules25245919' target='_blank'>https://doi: 10.3390/molecules25245919
  6. Roth F., Schmerbauch C., Ionescu E. et al. // J. Sens. Sens. Syst. 2015. V. 4. P. 133. https://doi.org/10.5194/jsss-4-133-2015
  7. Liu J., Tian C., Jiang T. et al. // J. Eur. Ceram. Soc. 2023. V. 43. P. 3191. https://doi.org/10.1016/j.jeurceramsoc.2023.02.045
  8. Xia K., Liu X., Liu H. et al. // Electrochim. Acta. 2021. V. 372. 137899.
  9. Mujib S.B., Cuccato R., Mukherjee S. et al. // Ceram. Int. 2020. V. 46. P. 3565. https://doi.org/10.1016/j.ceramint.2019.10.074
  10. Graczyk-Zajac M., Reinold L.M., Kaspar J. et al. // Nanomaterials. 2015. V. 5. P. 233. https://doi.org/10.3390/nano5010233
  11. Tang H., Wang K., Ren K. et al. // Ceram. Inter. 2023. V. 49. P. 20406. https://doi.org/10.1016/j.ceramint.2023.03.169
  12. Dong B.-B., Wang F.-H., Yang M.-Y. et al. // J. Membr. Sci. 2019. V. 579. P. 111. https://doi.org/10.1016/j.memsci.2019.02.066
  13. Zhuo R., Colombo P., Pantano C., Vogler E.A. // Acta Biomater. 2005. V. 1. P. 583. https://doi.org/10.1016/j.actbio.2005.05.005
  14. Arango-Ospina M., Xie F., Gonzalo-Juan I. et al. // Appl. Mater. Today. 2020. V. 18. 100482. https://doi.org/10.1016/j.apmt.2019.100482
  15. Liu H., ul Haq Tariq N., Han R. et al. // J. Non-Cryst. Solids. 2022. V. 575. P. 121204. https://doi.org/10.1016/j.jnoncrysol.2021.121204
  16. Iastrenski M.F., da Silva P.R.C., Tarley C.R.T., Segatelli M.G. // Ceram. Int. 2019. V. 45. P. 21698. https://doi.org/10.1016/j.ceramint.2019.07.170
  17. Wen Q., Yu Z., Riedel R. // Prog. Mater. Sci. 2020. V. 109. P. 100623. https://doi.org/10.1016/j.pmatsci.2019.100623
  18. Widgeon S.J., Sen S., Mera G. et al. // Chem. Mater. 2010. V. 22. P. 6221. https://doi.org/10.1021/cm1021432
  19. Breval E., Hammond M., Pantano C.G. // J. Am. Ceram. Soc. 1994. V. 77. P. 3012. https://doi.org/10.1111/j.1151-2916.1994.tb04538.x
  20. Lu K., Erb D. // Int. Mater. Rev. 2018. V. 63. P. 139. https://doi.org/10.1080/09506608.2017.1322247.
  21. Tian Z., Zhu W., Yan X., Su D. // Materials. 2022. V. 15. P. 6395. https://doi.org/10.3390/ma15186395
  22. Ricohermoso E.III, Klug F., Schlaak H. et al. // Int. J. Appl. Ceram. Technol. 2022. V. 19. P. 149. https://doi.org/10.1111/ijac.13800
  23. Ricohermoso E.III, Klug F., Schlaak H. et al. // J. Eur. Ceram. Soc. 2021. V. 41. P. 6377. https://doi.org/10.1016/j.jeurceramsoc.2021.07.001
  24. Soraru G.D., D’Andrea G., Campostrini R. et al. // J. Am. Ceram. Soc. 1995. V. 78. P. 379. https://doi.org/10.1111/j.1151-2916.1995.tb08811.x
  25. Ryan J.V., Colombo P., Howell J.A., Pantano C.G. // Int. J. Appl. Ceram. Technol. 2010. V. 7. P. 675. https://doi.org/10.1111/j.1744-7402.2009.02374.x
  26. Mandracci P., Rivolo P. // Coatings. 2023. V. 13. P. 1075. https://doi.org/10.3390/coatings13061075
  27. Hong N., Zhang Y., Sun Q. et al. // Materials. 2021. V. 14. P. 4827. https://doi.org/10.3390/ma14174827
  28. de Freitas A.S.M., Maciel C.C., Rodrigues J.S. et al. // Vacuum. 2021. V. 194. P. 110556. https://doi.org/10.1016/j.vacuum.2021.110556
  29. Gilman A.B., Zinoviev A.V., Kuznetsov A.A. // High Energy Chem. 2022. V. 56. P. 468. [Гильман А.Б., Зиновьев А.В., Кузнецов А.А. // Хим. выс. энергий. 2022. Т. 56. С. 470. https://doi.org/10.1134/S0018143922060078]
  30. Balderas I.E.G., Ruiz C.M., Andres E.R. et al. // Int. J. Appl. Ceram. Technol. 2024. V. 21. P. 3319. https://doi.org/10.1111/ijac.14796
  31. Yu S., Tu R., Ito A., Goto T. // Mater. Lett. 2010. V. 64. P. 2151. https://doi.org/10.1016/j.matlet.2010.07.022
  32. Yu S., Tu R., Goto T. // J. Eur. Ceram. Soc. 2016. V. 36. P. 403. http://dx.doi.org/10.1016/j.jeurceramsoc.2015.10.029
  33. Jacobson N.S., Opila E.J. // Metall. Trans. A. 1993. V. 24. P. 1212. https://doi.org/10.1007/BF02657254
  34. Sevast'yanov V.G., Ezhov Yu.S., Simonenko E.P., Kuznetsov N.T. Materials Science Trans. Forum. Tech. Publications, Switzerland. 2004. V. 457–460. Р. 59. https:// doi.org/10.4028/www.scientific.net/MSF.457-460.59
  35. Лебедев А.С., Еремяшев В.Е., Трофимов Е.А., Анфилогов В.Н. // Докл. АН. 2019. Т. 484. № 5. С. 559. https://doi.org/10.1134/S0012500819020046
  36. Шестаков В.А., Косяков В.И., Косинова М.Л. // Изв. АН. Сер. хим. 2019. Т. 11. С. 1983. https://doi.org/1066-5285/19/6811-1983
  37. Шестаков В.А., Селезнев В.А., Мутилин С.В. и др. // Журн. неорган. химии. 2023. Т. 68. № 5. С. 651. https://doi.org/10.1134/S0036023623600491
  38. Шестаков В.А., Косинова М.Л. // Журн. неорган. химии. 2024. Т. 64. № 1. С. 43. https://doi.org/10.31857/S0044457X24010059
  39. Shestakov V.A., Kosinova M.L. // Russ. J. Phys. Chem. A. 2024. V. 98. № 9. P. 2007. https://doi.org/10.1134/S0036024424701140
  40. Суляева В.С., Шестаков В.А., Румянцев Ю.М., Косинова М.Л. // Неорган. материалы. 2018. Т. 54. № 2. С. 146. https://doi.org/10.1134/S0020168518020152
  41. Шестаков В.А., Яковкина Л.В., Кичай В.Н. // Журн. неорган. химии. 2022. Т. 67. № 12. С. 1746. https://doi.org/10.31857/S0044457X22600608
  42. Кузнецов Ф.А., Буждан Я.М., Коковин Г.А. // Изв. СО АН СССР. Сер. хим. наук. 1975. № 2. № 1. С. 24.
  43. Kuznetsov F.A., Titov V.A. Proc. Int. Symp. on Advanced Materials (September 24–30, 1995). Jpn., P. 16.
  44. Термодинамические свойства индивидуальных веществ. / Под ред. Глушко В.П. и др. М.: Наука, 1988. Т. 3. Кн. 2. 395 с.

Supplementary files

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2. Fig. 1. CVD diagram of the thermal decomposition process of [(CH3)3Si]2O with a change in the total pressure in the reactor.

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3. Fig. 2. CVD diagram of the process in the [(CH3)3Si]2O + NO2 system with varying oxygen content in the initial gas mixture.

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4. Fig. 3. CVD diagram of the process in the [(CH3)3Si]2O + mNH3 system with varying ammonia content in the initial gas mixture.

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